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Plasma Technology unique ion beam technology has been applied to deliver a solution for manufacturing slanted features. The solution was demonstrated on challenging slanted grating for Augmented Reality where manufacturing tolerances are very strict. Excellent uniformity of the etching depth is demonstrated on large 200 mm wafer size at multiple slanted angle. Key process control for both masking and etching are also identified to demonstrate control of the slanting angle below ±2° with excellent parallelism.
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