PlasmaPro 1000 PECVD Brochure

100

Plasma Pro 1000 Stratum

Plasma Pro 1000 Stratum

Batch PECVD production solutions for the LED market

Batch PECVD production solutions for the LED market

Plasma Pro 1000 Stratum PECVD System Designed for the deposition of SiO 2 and SiNx layers The Plasma Pro 1000 Stratum PECVD has been specifically developed for passivation deposition in LED production. Its large area electrode and optimised showerhead design allows up to 61 x 2”, 15 x 4” or 7 x 6” wafers in a single load.

LEDs are now an integral part of our lives, providing lighting solutions for a growing number of applications, from backlit televisions to general lighting. The industry justifiably demands high throughput, device quality and lower cost of ownership. Oxford Instruments offers all these solutions.

Oxford Instruments Plasma Technology has been the world leading supplier of high volume batch plasma tools in the production market for over 15 years, with a wide installed base of LED production systems in operation. As the industry continues to evolve, we have the technology and expertise to offer the most up to date solutions to our customers.

The Plasma Pro 1000 Stratum PECVD tool provides outstanding benefits for LED manufacturers • 490mm electrode giving unparalleled throughput from industry leading batch sizes of up to 7 x 6” wafers • High quality device performance and yield • Reliable hardware and ease of serviceability for excellent uptime • Low cost of ownership • Optimised for batch production, the

Configurable to accommodate up to 7 x 6” wafers

Carrier can accommodate up to 61 x 2” wafers

Plasma Pro 1000 Stratum has a vacuum load lock as standard, with open load and cluster capability options

• System designed to minimise cleaning overhead

Number of wafers PECVD

Wafer size

450mm

1 1 3 7

12” (300mm) 8” (200mm) 6” (150mm) 4” (100mm)

Rapid component change and ease of chamber cleaning results in extended ‘uptime’

15 61

2” (50mm)

Plasma Pro 1000 Stratum

Plasma Pro 1000 Stratum

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