The synthesis and characterization of a novel molybdenum(III) amidinate towards vapor-phase growth of Mo-based materials Taylor Currie 1,2 , Zahra Ali 3 , Lisa McElwee-White 3 , Titel Jurca 1,2,4 1. Department of Chemistry, University of Central Florida, Orlando, Florida, USA, 32816; 2. Renewable Energy and Chemical Transformations Cluster, University of Central Florida, Orlando, Florida, USA, 32816; 3. Department of Chemistry, University of Florida, Gainesville, Florida, USA, 32611; 4. NanoScience &Technology Center, University of Central Florida, Orlando, Florida, USA, 32826. Due to their broad ranging applications in electronics, solar energy materials, sensing, lubricants and catalysis, Mo-based thin films have received intense interest in recent years. These materials include molybdenum oxide MoOx (2 ≤ x ≤ 3), dichalcogenides MoE2 (E = S, Se, Te), nitrides MoN/MoNOx, carbide MoCx and elemental metal films. By leveraging vapor phase growth methods, extremely precise films from the ultra-thin Å (atomic layer deposition – ALD) all the way to the “thick” µm (chemical vapor deposition – CVD) domain can be achieved. There is still a vast disparity between the amount of Mo-based materials work being done, and the availability of diverse molecular starting materials. As a result, there is a continuing need to discover new molecular building blocks which can enable different vapor phase growth processes over broad temperature ranges, and with a variety of co-reactants. Thermally stable, halide-free precursors which can facilitate growth of crystalline materials are particularly attractive. Herein, we present a broad thermophysical mapping of commercially available Mo-based precursors, and use that as a backdrop and guide towards the targeted synthesis of a new species exhibiting properties not covered by the current commercially accessible crop. Nominally, precursors capable of operating at varying temperatures, and featuring diverse chemical moieties to facilitate surface interactions are required to create a broad portfolio that meets modern materials growth demands. To that effect, we report the synthesis and comprehensive characterization of tris(N,N’-di-isopropylacetamidinate)molybdenum(III), Mo(iPr-AMD)3. We then demonstrate application towards the plasma-assisted ALD growth of molybdenum nitride, and the aerosol-assisted CVD growth of molybdenum oxide, accompanied by requisite surface and bulk characterization.
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