Process News Spring 2016 | OI Plasma Technology

PROCESS NEWS

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A Newsletter from Oxford Instruments Plasma Technology

IN THIS ISSUE:

Providing leading edge tools and processes to key markets worldwide

2 Two dimensional materials and heterostructures

3 Low temperature plasma

assisted ALD of conductive films

Optoelectronics

4 Collaboration proves a ‘win-win’ for TU/e and Oxford Instruments 6 Plasma Pro ® systems bought for Chinese LED Manufacture 7 Training: buy one get one half price 8 The Application of Bosch™ Deep Silicon Etch to the Manufacture of X-Ray Lenses

Nanotechnology

Discrete Devices Sensors

10 Micromachining silicon

structures on thin membranes using plasma etching

12 Power device development enabled through University of Glasgow collaboration 13 Energy savings win us a ‘Go Green’ award

13 Record numbers attend 4 th

BTNT seminar in Chennai, India

14 New etching process for

Magnetic RAM developed by Cornell and Oxford Instruments

16 Watch our informative webinars

www.oxford-instruments.com/plasma

PROCESS NEWS 1

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