Process News Spring 2016 | OI Plasma Technology

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Just some of our excellent recorded webinars are listed below • Latest advances in Quantum Computing capabilities • A valley-spin qubit in a carbon nanotube, Dr Edward Laird, Oxford University • Next-generation cQED processors with vertical I/O, Dr. Alessandro Bruno, TU Delft • Exploring Flatlands: Fabrication Technologies • Understanding of the use of controlled etching processes for novel 2D heterostructures, Dr Andrey V Kretinin, University of Manchester • Use of ALD in the deposition of low-resistance contacts and high-k dielectrics on graphene, Dr A A Bol, Eindhoven University of Technology • Growth and characterization of graphene and hexagonal boron nitride via CVD and plasma-enhanced CVD, Dr Ravi Sundaram, Oxford Instruments • Process Solutions for Wide Band Gap Power Semiconductor Devices • Silicon Compatible GaN Power Electronics, Professor Iain Thayne, University of Glasgow • Plasma etch and deposition processes for GaN and SiC power semiconductor devices, Chris Hodson, Oxford Instruments to view these and more visit: www.oxinst.com/PTWebinars

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