Process News Spring 2016 | OI Plasma Technology


Two dimensional materials and heterostructures
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Low temperature plasma-assisted ALD of conductive films
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Collaboration proves a ‘win-win’ for TU/e and Oxford Instruments
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PlasmaPro® systems bought for Chinese LED manufacture
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Training: buy one get one half price
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The Application of Bosch™ Deep Silicon Etch to the Manufacture of X-Ray Lenses
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Micromachining silicon structures on thin membranes using plasma etching
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Power device development enabled through University of Glasgow collaboration
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Energy savings win us a ‘Go Green’ award
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500 attendees 2 days 24 talks 30 posters
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Record numbers attend 4th ‘BTNT’ seminar in Chennai, India
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New etching process for Magnetic RAM developed by Cornell and Oxford Instruments
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Watch our informative webinars
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