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Nanoscribe 3D Lithography System CLEANROOM

CLEANROOM

Electron Beam Lithography (EBL)

The light of an ultra-short pulsed laser can be focused with a high intensity to expose a sensitive photo-resist by two-photon absorption. This process causes a chemical and/or physical change of the photoresist within a small pixel (“voxel”). This voxel typically is of ellipsoidal shape and is the basic building block for the fabrication of 3D structures. With the Nanoscribe 3D lithography system, mi- cro-structures can be rapidly fabricated with a 300 nm resolution. The available resists are IP-S, IP-Dip, IP-L and others. This course gives participants a basic understanding of photolithography. It cov- ers tool setup and software, system initialization. Process issues and process optimization will also be discussed. PARTICIPANT PROFILE This course is intended for students and research professionals from KAUST working in micro and nanofabrication. PREREQUISITES • Active Badger account

E-beam lithography is a mature direct writing technology that uses an acceler- ated beam of electrons to pattern features down to sub-10 nm on appropriate electron beam sensitive resists. The electron beam-matter interactions cause chemical reactions or scission of bonds and therefore alter locally the solubility of the resist in certain developers, enabling selective removal of either the ex- posed or non-exposed regions of the resist by immersing it in a developer. The JEOL JBX-6300 FS is a high throughput 100KeV machine that defines the state

• Laboratory Safety Training • Hazardous Waste Training • Emergency Incident Preparedness Training

• Cleanroom Safety Training • Basic Wet Bench Training MAXIMUM PARTICIPANTS 4 DURATION 3 hours FREQUENCY Monthly

of the art in the field and has proven capability to reliably print structures with critical dimension down to 7-8 nm thanks to the adjustable beam diameter that goes down to 2 nm and the unpar- alleled overlay and stitching accuracy of 20 nm. The tool is equipped with thermally stabilized 10 position airlock that allows for long unattended exchange of wafers. Cassettes that are able to accommodate any size of wafers, from few mm up to full 6-inch wafer are available. The layouts are prepared by the BEAMER software that can handle and standard layout format (e.g. GDSII, CIF, DXF, etc.) This course gives participants a basic under- standing of electron beam lithography and design software training. It covers tool setup and design considerations. Process issues and process opti- mization will also be discussed.

PREREQUISITES • Active Badger account • Laboratory Safety Training • Hazardous Waste Training • Emergency Incident Preparedness Training • Cleanroom Safety Training • Basic Wet Bench Training MAXIMUM PARTICIPANTS 4 DURATION 20 hours FREQUENCY Monthly

PARTICIPANT PROFILE This course is intended for students and research professionals from KAUST working in micro and nanofabrication.

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Specialized Instrument & Method Training Catalog

Edition 1, Sept e mber 2020

239

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