Ultraviolet radiation range objectives for bright-field observation M Plan UV
VMU FS70
Features
> Bright-field observation/ultraviolet observation/laser machining > Wavelength compensation 266 nm and 550 nm > Infinity corrected > Long working distance > Plan
Dimensions
M Plan UV 10X
M Plan UV 50X
20 (Working distance)
12 (Working distance)
83
75
5
5
( Parfocalizing distance ) 95
( Parfocalizing distance ) 95
M Plan UV 20X
M Plan UV 80X
10 (Working distance)
15 (Working distance)
80
85
5
5
( Parfocalizing distance ) 95
( Parfocalizing distance ) 95
Specifications
Real FOV (mm)
f (mm)
Mass (g)
R (μm) ( λ = 550 nm)
±DOF (μm)
Model
N.A.
W.D. (mm)
Code No.
ø24 eyepiece 2/3 inch camera
f 266
f 550
M Plan UV
M Plan UV 10X M Plan UV 20X M Plan UV 50X M Plan UV 80X
378-844-15 378-837-8 378-838-8 378-839-5
0.25 0.37 0.41 0.55
20.0 15.0 12.0 10.0
20 10
20.3 10.4
1.1 0.7 0.7 0.5
4.4 2.0 1.6 0.9
2.4 1.2
0.66×0.88 0.33×0.44 0.13×0.18 0.08×0.11
310 370 400
4
4.2 2.9
0.48
2.5 380 • When projecting a mask image on a specimen by using a YAG laser system mounted on a Mitutoyo microscope unit, the mask image will be scaled by the factor f/200 times ( f= 200 mm, Mitutoyo tube lens). Since the focal length (f) in ultraviolet radiation ( λ = 266 nm) is slightly smaller than that in visible radiation ( λ = 550 nm) as above, the working area in ultraviolet radiation also becomes slightly smaller than the mask image in visible radiation. • Every resolution and single objective's depth of focus in the above table is a value determined on the basis of a reference wavelength ( λ = 0.55 μm). 0.3
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