Ultraviolet radiation range objectives for bright-field observation (with cover-glass thickness compensation) LCD Plan UV
VMU FS70
Features
> Bright-field observation/ultraviolet observation/Laser machining > Wavelength compensation 266 nm and 550 nm > Infinity corrected > Long working distance > Plan
> Design enables observation through a 3.5 mm cover glass (material: sio2) Note: Mitutoyo is ready to design and manufacture a specific sheet of glass according to a specified glass thickness, material or refractive index, please contact your local Mitutoyo sales office.
Dimensions
LCD Plan UV 50X
LCD Plan UV 20X
15.22 (Working distance)
12.62 (Working distance)
82.6
80
5
( Parfocalizing distance ) 95.22
( Parfocalizing distance ) 95.22
5
Specifications
Real FOV (mm)
f (mm)
Mass (g)
R (μm) ( λ = 550 nm)
±DOF (μm)
Model
N.A.
W.D. (mm)
Code No.
ø24 eyepiece 2/3 inch camera
f 266
f 550
LCD Plan UV LCD Plan UV 20X (t0.7) LCD Plan UV 50X (t0.7)
378-892-8 378-893-8
10
10.4
0.7 0.7
2.0 1.6
1.2
0.33×0.44 0.13×0.18
370
0.37 0.41
14.98 12.38
4 400 • When projecting a mask image on a specimen by using a YAG laser system mounted on a Mitutoyo microscope unit, the mask image will be scaled by the factor f/200 times ( f= 200 mm, Mitutoyo tube lens). Since the focal length (f) in ultraviolet radiation ( λ = 266 nm) is slightly smaller than that in visible radiation ( λ = 550 nm) as above, the working area in ultraviolet radiation also becomes slightly smaller than the mask image in visible radiation. • Every resolution and single objective's depth of focus in the above table is a value determined on the basis of a reference wavelength ( λ = 0.55 μm). 4.2 0.48
35
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